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Unveiling the ferroelectric behavior of HfO2 thin films using fast DualEELS analysis

dc.contributor.authorLongo, Paolo
dc.contributor.authorFavia, Paola
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorVermeulen, Bart
dc.contributor.authorSpillane, Liam
dc.contributor.authorTwesten, Ray
dc.date.accessioned2021-10-27T12:56:04Z
dc.date.available2021-10-27T12:56:04Z
dc.date.issued2019
dc.identifier.issn1431-9276
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33472
dc.sourceIIOimport
dc.titleUnveiling the ferroelectric behavior of HfO2 thin films using fast DualEELS analysis
dc.typeJournal article
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorVermeulen, Bart
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.source.peerreviewyes
dc.source.beginpage588
dc.source.endpage589
dc.source.journalMicroscopy and Microanalysis
dc.source.issueS2
dc.source.volume25
dc.identifier.urlhttps://doi.org/10.1017/S1431927619003672
imec.availabilityPublished - imec


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