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Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

dc.contributor.authorLuong, Vu
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorOpsomer, Karl
dc.contributor.authorRip, Jens
dc.contributor.authorHendrickx, Eric
dc.contributor.authorHeyns, Marc
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorLaubis, Christian
dc.contributor.authorScholze, Frank
dc.date.accessioned2021-10-27T13:02:44Z
dc.date.available2021-10-27T13:02:44Z
dc.date.issued2019
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33484
dc.sourceIIOimport
dc.titleAssessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
dc.typeJournal article
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage61607
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue6
dc.source.volume37
dc.identifier.urlhttps://doi.org/10.1116/1.5125662
imec.availabilityPublished - open access


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