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Unbiased roughness measurements: Subtracting out SEM effects, part 3

dc.contributor.authorMack, Chris
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorLorusso, Gian
dc.date.accessioned2021-10-27T13:05:50Z
dc.date.available2021-10-27T13:05:50Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33490
dc.sourceIIOimport
dc.titleUnbiased roughness measurements: Subtracting out SEM effects, part 3
dc.typeProceedings paper
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorLorusso, Gian
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage109590P
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIII
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose. CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2515898
imec.availabilityPublished - open access
imec.internalnotesSPIE Proceedings; Volume 10959


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