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Effect pf substrate roughness on the nucleation and growth behavior of microwave plasma enhanced CVD diamond films

dc.contributor.authorMallik, Awadesh
dc.contributor.authorMary Joy, Rani
dc.contributor.authorRouzbahani Bayatani, Rozita
dc.contributor.authorLloret, Fernando
dc.contributor.authorPobedinskas, Paulius
dc.contributor.authorHaenen, Ken
dc.date.accessioned2021-10-27T13:24:44Z
dc.date.available2021-10-27T13:24:44Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33525
dc.sourceIIOimport
dc.titleEffect pf substrate roughness on the nucleation and growth behavior of microwave plasma enhanced CVD diamond films
dc.typeOral presentation
dc.contributor.imecauthorMallik, Awadesh
dc.contributor.imecauthorMary Joy, Rani
dc.contributor.imecauthorRouzbahani Bayatani, Rozita
dc.contributor.imecauthorLloret, Fernando
dc.contributor.imecauthorPobedinskas, Paulius
dc.contributor.imecauthorHaenen, Ken
dc.contributor.orcidimecPobedinskas, Paulius::0000-0001-8136-5172
dc.contributor.orcidimecHaenen, Ken::0000-0001-6711-7367
dc.source.peerreviewno
dc.source.conferenceHasselt Diamond Workshop 2019 - SBDD XXIV
dc.source.conferencedate13/03/2019
dc.source.conferencelocationHasselt Belgium
imec.availabilityPublished - imec


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