Show simple item record

LCDU optimization of STT-MRAM 50nm pitch MTJ pillars for process window improvement

dc.contributor.authorPak, Murat
dc.contributor.authorCrotti, Davide
dc.contributor.authorYasin, Farrukh
dc.contributor.authorErcken, Monique
dc.contributor.authorHalder, Sandip
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVanelderen, Pieter
dc.contributor.authorSouriau, Laurent
dc.contributor.authorHody, Hubert
dc.contributor.authorKar, Gouri Sankar
dc.date.accessioned2021-10-27T15:18:34Z
dc.date.available2021-10-27T15:18:34Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33722
dc.sourceIIOimport
dc.titleLCDU optimization of STT-MRAM 50nm pitch MTJ pillars for process window improvement
dc.typeMeeting abstract
dc.contributor.imecauthorPak, Murat
dc.contributor.imecauthorCrotti, Davide
dc.contributor.imecauthorYasin, Farrukh
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorHody, Hubert
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecYasin, Farrukh::0000-0002-7295-0254
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage109570R
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography X
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2515023
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10957


Files in this item

Thumbnail
Name:
39589.pdf
Size:
2.861Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record