dc.contributor.author | De Smedt, Frank | |
dc.contributor.author | Vinckier, Chris | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Cornelissen, Ingrid | |
dc.contributor.author | Heyns, Marc | |
dc.date.accessioned | 2021-10-06T10:57:27Z | |
dc.date.available | 2021-10-06T10:57:27Z | |
dc.date.issued | 1999 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3372 | |
dc.source | IIOimport | |
dc.title | A mechanism for the silicon oxide growth by ozonated solutions | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Cornelissen, Ingrid | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 1117 | |
dc.source.conference | Electrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing | |
dc.source.conferencedate | 17/10/1999 | |
dc.source.conferencelocation | Honolulu, HI USA | |
imec.availability | Published - open access | |