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Molecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formation

dc.contributor.authorPark, Juhae
dc.contributor.authorLee, Sung-Gyu
dc.contributor.authorVesters, Yannick
dc.contributor.authorSeveri, Joren
dc.contributor.authorMyungwoong, Kim
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorOh, Hye-Keun
dc.contributor.authorHur, Su-Mi
dc.date.accessioned2021-10-27T15:33:42Z
dc.date.available2021-10-27T15:33:42Z
dc.date.issued2019
dc.identifier.issn2073-4360
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33748
dc.sourceIIOimport
dc.titleMolecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formation
dc.typeJournal article
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.source.peerreviewyes
dc.source.beginpage1923
dc.source.journalPolymers
dc.source.issue12
dc.source.volume11
dc.identifier.urlhttps://doi.org/10.3390/polym11121923
imec.availabilityPublished - imec


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