dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Petersen, John | |
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Vandenberghe, Geert | |
dc.date.accessioned | 2021-10-27T16:15:08Z | |
dc.date.available | 2021-10-27T16:15:08Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33815 | |
dc.source | IIOimport | |
dc.title | Unraveling the EUV photoresist reactions : which, how much, and how do they relate to printing performance | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | Petersen, John | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 109570I | |
dc.source.conference | Extreme Ultraviolet (EUV) Lithography X | |
dc.source.conferencedate | 24/02/2019 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | https://doi.org/10.1117/12.2515456 | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 10957 | |