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Etch challenges in high aspect ratio aupervia patterning

dc.contributor.authorPuliyalil, Harinarayanan
dc.contributor.authorFeurprier, Yannick
dc.contributor.authorBriggs, Basoene
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorWilson, Chris
dc.contributor.authorKumar, Kaushik
dc.date.accessioned2021-10-27T16:25:13Z
dc.date.available2021-10-27T16:25:13Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33830
dc.sourceIIOimport
dc.titleEtch challenges in high aspect ratio aupervia patterning
dc.typeProceedings paper
dc.contributor.imecauthorPuliyalil, Harinarayanan
dc.contributor.imecauthorFeurprier, Yannick
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorKumar, Kaushik
dc.contributor.orcidimecPuliyalil, Harinarayanan::0000-0002-9749-5307
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.source.peerreviewno
dc.source.conference11th PESM-2019
dc.source.conferencedate20/05/2019
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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