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EUVL is being inserted in HVM in 2019 : what are the mask related challenges remaining ?

dc.contributor.authorRonse, Kurt
dc.contributor.authorJonckheere, Rik
dc.contributor.authorGallagher, Emily
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorVan Look, Lieve
dc.contributor.authorHendrickx, Eric
dc.contributor.authorKim, Ryan Ryoung han
dc.date.accessioned2021-10-27T17:14:38Z
dc.date.available2021-10-27T17:14:38Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33906
dc.sourceIIOimport
dc.titleEUVL is being inserted in HVM in 2019 : what are the mask related challenges remaining ?
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage111770A
dc.source.conference35th European Mask and Lithography Conference (EMLC 2019)
dc.source.conferencedate17/06/2019
dc.source.conferencelocationDresden Germany
dc.identifier.urlhttps://doi.org/10.1117/12.2535821
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 11177


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