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Status and review of 2-D carrier profiling using scanning probe microscopy

dc.contributor.authorDe Wolf, Peter
dc.contributor.authorStephenson, Robert
dc.contributor.authorTrenkler, Thomas
dc.contributor.authorClarysse, Trudo
dc.contributor.authorHantschel, Thomas
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-06T11:00:12Z
dc.date.available2021-10-06T11:00:12Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3391
dc.sourceIIOimport
dc.titleStatus and review of 2-D carrier profiling using scanning probe microscopy
dc.typeProceedings paper
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage28
dc.source.endpage38
dc.source.conference5th International Workshop on the Measurement, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors
dc.source.conferencedate28/03/1999
dc.source.conferencelocationResearch Triangle Park, NC USA
imec.availabilityPublished - open access


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