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Silicon surface texturing by reactive ion etching

dc.contributor.authorDekkers, Harold
dc.contributor.authorDuerinckx, Filip
dc.contributor.authorSzlufcik, Jozef
dc.contributor.authorNijs, Johan
dc.date.accessioned2021-10-06T11:01:14Z
dc.date.available2021-10-06T11:01:14Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3398
dc.sourceIIOimport
dc.titleSilicon surface texturing by reactive ion etching
dc.typeOral presentation
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorDuerinckx, Filip
dc.contributor.imecauthorSzlufcik, Jozef
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecDuerinckx, Filip::0000-0003-2570-7371
dc.source.peerreviewno
dc.source.conferenceMRS European Conference on Photovoltaics; 25-27 October 1999; Cracow, Poland.
imec.availabilityPublished - imec


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