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Impact of SiO2 surface composition on trimethylsilane passivation for area-selective deposition

dc.contributor.authorSoethoudt, Job
dc.contributor.authorCrahaij, Steven
dc.contributor.authorConard, Thierry
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-27T18:42:40Z
dc.date.available2021-10-27T18:42:40Z
dc.date.issued2019
dc.identifier.issn2050-7526
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34039
dc.sourceIIOimport
dc.titleImpact of SiO2 surface composition on trimethylsilane passivation for area-selective deposition
dc.typeJournal article
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewyes
dc.source.beginpage11911
dc.source.endpage11918
dc.source.journalJournal of Materials Chemistry C
dc.source.issue38
dc.source.volume7
dc.identifier.urlhttps://pubs.rsc.org/en/content/articlelanding/2019/tc/c9tc04091a#!divAbstract
imec.availabilityPublished - imec


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