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Defect Mitigation in Area-Selective Atomic Layer Deposition of Ruthenium on Titanium Nitride/Dielectric Nanopatterns

dc.contributor.authorSoethoudt, Job
dc.contributor.authorHody, Hubert
dc.contributor.authorSpampinato, Valentina
dc.contributor.authorFranquet, Alexis
dc.contributor.authorBriggs, Basoene
dc.contributor.authorChan, BT
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-27T18:44:44Z
dc.date.available2021-10-27T18:44:44Z
dc.date.issued2019
dc.identifier.issn2196-7350
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34042
dc.sourceIIOimport
dc.titleDefect Mitigation in Area-Selective Atomic Layer Deposition of Ruthenium on Titanium Nitride/Dielectric Nanopatterns
dc.typeJournal article
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorHody, Hubert
dc.contributor.imecauthorSpampinato, Valentina
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecSpampinato, Valentina::0000-0003-3225-6740
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewyes
dc.source.beginpage1900896
dc.source.journalAdvanced Materials Interfaces
dc.source.issue20
dc.source.volume6
dc.identifier.urlhttps://doi.org/10.1002/admi.201900896
imec.availabilityPublished - imec


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