Show simple item record

Enhanced wafer overlay residuals control; deep sub-nanometer at sub-millimeter lateral resolution

dc.contributor.authorSufrin, Yael
dc.contributor.authorLeray, Philippe
dc.contributor.authorCanga, Eren
dc.contributor.authorCohen, Avi
dc.contributor.authorDmitriev, Vladimir
dc.contributor.authorGorhad, Kujan
dc.date.accessioned2021-10-27T19:09:57Z
dc.date.available2021-10-27T19:09:57Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34080
dc.sourceIIOimport
dc.titleEnhanced wafer overlay residuals control; deep sub-nanometer at sub-millimeter lateral resolution
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorCanga, Eren
dc.contributor.orcidimecCanga, Eren::0000-0002-2322-8070
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage111770J
dc.source.conference35th European Mask and Lithography Conference (EMLC 2019)
dc.source.conferencedate24/02/2019
dc.source.conferencelocationDresden Germany
dc.identifier.urlhttps://doi.org/10.1117/12.2535641
imec.availabilityPublished - open access
imec.internalnotesSPIE Proceedings; Volume 11177


Files in this item

Thumbnail
Name:
43191.pdf
Size:
574.9Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record