Show simple item record

Exploring resist options for EUV layers of IMEC N5 CMOS vehicle

dc.contributor.authorThiam, Arame
dc.contributor.authorPaolillo, Sara
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorErcken, Monique
dc.contributor.authorWong, Patrick
dc.contributor.authorCharley, Anne-Laure
dc.date.accessioned2021-10-27T19:34:13Z
dc.date.available2021-10-27T19:34:13Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34115
dc.sourceIIOimport
dc.titleExploring resist options for EUV layers of IMEC N5 CMOS vehicle
dc.typeProceedings paper
dc.contributor.imecauthorThiam, Arame
dc.contributor.imecauthorPaolillo, Sara
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.source.peerreviewyes
dc.source.conference32nd International Microprocesses and Nanotechnology Conference - MNC
dc.source.conferencedate28/10/2019
dc.source.conferencelocationHiroshima Japan
dc.identifier.urlhttp://imnc.jp/MNC2019program08.pdf
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record