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Cobalt and Ruthenium drift in ultra-thin oxides

dc.contributor.authorTierno, Davide
dc.contributor.authorVarela Pedreira, Olalla
dc.contributor.authorWu, Chen
dc.contributor.authorJourdan, Nicolas
dc.contributor.authorKljucar, Luka
dc.contributor.authorTokei, Zsolt
dc.contributor.authorCroes, Kristof
dc.date.accessioned2021-10-27T19:41:12Z
dc.date.available2021-10-27T19:41:12Z
dc.date.issued2019
dc.identifier.issn0026-2714
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34125
dc.sourceIIOimport
dc.titleCobalt and Ruthenium drift in ultra-thin oxides
dc.typeJournal article
dc.contributor.imecauthorTierno, Davide
dc.contributor.imecauthorVarela Pedreira, Olalla
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorJourdan, Nicolas
dc.contributor.imecauthorKljucar, Luka
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCroes, Kristof
dc.contributor.orcidimecTierno, Davide::0000-0003-4915-904X
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.source.peerreviewyes
dc.source.beginpage113407
dc.source.journalMicroelectronics Reliability
dc.source.volume100-101
dc.identifier.urlhttps://doi.org/10.1016/j.microrel.2019.113407
imec.availabilityPublished - imec
imec.internalnotesSpecial issue ESREF 2019


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