Evaluation of local CD and placement distribution on EUV mask and its impact on wafer

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Authors
Vaenkatesan, Vidya; Van Adrichem, Paul; Kooiman, Marleen; Kubis, Michael; Van Look, Lieve; Frommhold, Andreas; Gallagher, Emily; Nam, DS; Mulkens, Jan; Finders, Jo; Rispens, Gijsbert
DOI
10.1117/12.2538243
Conference
XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology 2019
Title
Evaluation of local CD and placement distribution on EUV mask and its impact on wafer
Publication type
Proceedings paper
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