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CoSi2 formation in the presence of interfacial silicon oxide

dc.contributor.authorDetavernier, C.
dc.contributor.authorVan Meirhaeghe, R. L.
dc.contributor.authorCardon, F.
dc.contributor.authorDonaton, R. A.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-06T11:04:01Z
dc.date.available2021-10-06T11:04:01Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3416
dc.sourceIIOimport
dc.titleCoSi2 formation in the presence of interfacial silicon oxide
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage2930
dc.source.endpage32
dc.source.journalAppl. Phys. Lett.
dc.source.issue20
dc.source.volume74
imec.availabilityPublished - imec


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