A new concept to qualify pattern shift on EUV scanners

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Authors
Van den berg, Pim; Van Look, Lieve; Van Swaaij, Gijs; Van Rhee, Tasja; Schiffelers, Guido; Gielis, Joost
Conference
35th European Mask and Lithography Conference EMLC 2019
Title
A new concept to qualify pattern shift on EUV scanners
Publication type
Oral presentation
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