Show simple item record

Wet-chemical etching of III-V semiconductors: towards atomic-layer-scale processing

dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorArnauts, Sophia
dc.contributor.authorKelly, John
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-27T20:40:12Z
dc.date.available2021-10-27T20:40:12Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34210
dc.sourceIIOimport
dc.titleWet-chemical etching of III-V semiconductors: towards atomic-layer-scale processing
dc.typeMeeting abstract
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.source.peerreviewyes
dc.source.beginpage1227
dc.source.conference235th ECS Meeting
dc.source.conferencedate17/04/2017
dc.source.conferencelocationDallas, TX USA
dc.identifier.urlhttp://ma.ecsdl.org/content/MA2019-01/24/1227.abstract
imec.availabilityPublished - imec
imec.internalnotesECS Meeting Abstracts; Vol. MA2019-01


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record