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Critical issues in the integration of Copper and low-k dielectrics

dc.contributor.authorDonaton, R. A.
dc.contributor.authorCoenegrachts, Bart
dc.contributor.authorMaex, Karen
dc.contributor.authorStruyf, Herbert
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorBeyer, Gerald
dc.contributor.authorRichard, Emmanuel
dc.contributor.authorVervoort, Iwan
dc.contributor.authorFyen, Wim
dc.contributor.authorGrillaert, Joost
dc.contributor.authorvan der Groen, Sonja
dc.contributor.authorStucchi, Michele
dc.contributor.authorDe Roest, David
dc.date.accessioned2021-10-06T11:06:00Z
dc.date.available2021-10-06T11:06:00Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3428
dc.sourceIIOimport
dc.titleCritical issues in the integration of Copper and low-k dielectrics
dc.typeProceedings paper
dc.contributor.imecauthorCoenegrachts, Bart
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorDe Roest, David
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.beginpage262
dc.source.endpage264
dc.source.conferenceProceedings of the International Interconnect Technology Conference - IITC; San Francisco, CA, USA.
imec.availabilityPublished - imec


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