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Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning

dc.contributor.authorVanelderen, Pieter
dc.contributor.authorBlanco, Victor
dc.contributor.authorMao, Ming
dc.contributor.authorTomczak, Yoann
dc.contributor.authorDe Roest, David
dc.contributor.authorKissoon, Nicola
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorRispens, Gijsbert
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorPathak, Abhinav
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDe Poortere, Etienne
dc.contributor.authorMc Manus, Moyra
dc.contributor.authorPiumi, Daniele
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-27T21:51:29Z
dc.date.available2021-10-27T21:51:29Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34310
dc.sourceIIOimport
dc.titleImpact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
dc.typeProceedings paper
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorKissoon, Nicola
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorRispens, Gijsbert
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.imecauthorPathak, Abhinav
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDe Poortere, Etienne
dc.contributor.imecauthorMc Manus, Moyra
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage109570S
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography X
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2515503
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 10957


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