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Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement

dc.contributor.authorVesters, Yannick
dc.contributor.authorJiang, Jing
dc.contributor.authorYamamoto, Hiroki
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorKozawa, Takahiro
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-27T22:50:37Z
dc.date.available2021-10-27T22:50:37Z
dc.date.issued2019-12
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34389
dc.sourceIIOimport
dc.titleSensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement
dc.typeJournal article
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage43506
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue4
dc.source.volume17
dc.identifier.urlhttps://doi.org/10.1117/1.JMM.17.4.043506
imec.availabilityPublished - imec


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