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Photoresist absorption measurement at extreme ultraviolet (EUV) wavelength by thin film transmission method

dc.contributor.authorVesters, Yannick
dc.contributor.authorShehzad, Atif
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorPollentier, Ivan
dc.contributor.authorNannarone, Stefano
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-27T22:51:23Z
dc.date.available2021-10-27T22:51:23Z
dc.date.issued2019
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34390
dc.sourceIIOimport
dc.titlePhotoresist absorption measurement at extreme ultraviolet (EUV) wavelength by thin film transmission method
dc.typeJournal article
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage57
dc.source.endpage66
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue1
dc.source.volume32
dc.identifier.urlhttps://doi.org/10.2494/photopolymer.32.57
imec.availabilityPublished - open access


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