dc.contributor.author | Vohra, Anurag | |
dc.contributor.author | Porret, Clément | |
dc.contributor.author | Kohen, David | |
dc.contributor.author | Folkersma, Steven | |
dc.contributor.author | Bogdanowicz, Janusz | |
dc.contributor.author | Schaekers, Marc | |
dc.contributor.author | Tolle, John | |
dc.contributor.author | Hikavyy, Andriy | |
dc.contributor.author | Capogreco, Elena | |
dc.contributor.author | Witters, Liesbeth | |
dc.contributor.author | Langer, Robert | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.contributor.author | Loo, Roger | |
dc.date.accessioned | 2021-10-27T23:00:36Z | |
dc.date.available | 2021-10-27T23:00:36Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/34402 | |
dc.source | IIOimport | |
dc.title | Ge:B and GeSn:B low temperature selective epitaxial growth schemes for source/drain layers in Ge pMOS devices | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Vohra, Anurag | |
dc.contributor.imecauthor | Porret, Clément | |
dc.contributor.imecauthor | Folkersma, Steven | |
dc.contributor.imecauthor | Bogdanowicz, Janusz | |
dc.contributor.imecauthor | Schaekers, Marc | |
dc.contributor.imecauthor | Hikavyy, Andriy | |
dc.contributor.imecauthor | Capogreco, Elena | |
dc.contributor.imecauthor | Witters, Liesbeth | |
dc.contributor.imecauthor | Langer, Robert | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.orcidimec | Vohra, Anurag::0000-0002-2831-0719 | |
dc.contributor.orcidimec | Porret, Clément::0000-0002-4561-348X | |
dc.contributor.orcidimec | Bogdanowicz, Janusz::0000-0002-7503-8922 | |
dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
dc.contributor.orcidimec | Langer, Robert::0000-0002-1132-3468 | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.source.peerreview | no | |
dc.source.conference | 2019 E-MRS Fall Meeting and Exhibit, Symposium B: Integration of advanced materials on silicon: from classical to quantum applic | |
dc.source.conferencedate | 16/09/2019 | |
dc.source.conferencelocation | Warsaw Poland | |
imec.availability | Published - imec | |