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Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing

dc.contributor.authorErcken, Monique
dc.contributor.authorMoelants, Myriam
dc.contributor.authorPollers, Ingrid
dc.contributor.authorVan Puyenbroeck, Ilse
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorPawlowski, G.
dc.contributor.authorSpiess, Walter
dc.date.accessioned2021-10-06T11:09:31Z
dc.date.available2021-10-06T11:09:31Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3449
dc.sourceIIOimport
dc.titleOptimization of an advanced positive DUV resist for 248 nm L/S pattern printing
dc.typeJournal article
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorMoelants, Myriam
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage353
dc.source.endpage357
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume46
imec.availabilityPublished - open access
imec.internalnotesMNE 98 - International Conf. on Micro- and Nanofabrication; 22-24 September 1998; Leuven, Belgium


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