Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing

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Authors

Ercken, Monique; Moelants, Myriam; Pollers, Ingrid; Van Puyenbroeck, Ilse; Goethals, Mieke; Ronse, Kurt; Pawlowski, G.; Spiess, Walter

Issue

1_4

Journal

Microelectronic Engineering

Volume

46

Title

Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing

Publication type

Journal article

Embargo date

9999-12-31

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