Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing

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Author(s)

Ercken, Monique

;

Moelants, Myriam

;

Pollers, Ingrid

;

Van Puyenbroeck, Ilse

;

Goethals, Mieke

;

;

;

Journal

Microelectronic Engineering

Metrics

1978 since deposited on 2021-10-06

Acq. date: 2025-10-25