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Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Publication:
Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Date
1999
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ercken, Monique
;
Moelants, Myriam
;
Pollers, Ingrid
;
Van Puyenbroeck, Ilse
;
Goethals, Mieke
;
Ronse, Kurt
;
Pawlowski, G.
;
Spiess, Walter
Journal
Microelectronic Engineering
Abstract
Description
Metrics
Views
1978
since deposited on 2021-10-06
427
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations
Metrics
Views
1978
since deposited on 2021-10-06
427
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations