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Accuracy assessment between on product and on-optical-target overlay metrology with optical microscopy, SEM and STEM

dc.contributor.authorAbranovitz, Yaniv
dc.contributor.authorLevin, G.
dc.contributor.authorSarig, L.
dc.contributor.authorLevi, S.
dc.contributor.authorAdan, O.
dc.contributor.authorTilson, A.
dc.contributor.authorArjavac, J.
dc.contributor.authorStrauss, M.
dc.contributor.authorKwakman, L.
dc.contributor.authorLeray, Philippe
dc.contributor.authorHalder, Sandip
dc.date.accessioned2021-10-28T20:08:57Z
dc.date.available2021-10-28T20:08:57Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34584
dc.sourceIIOimport
dc.titleAccuracy assessment between on product and on-optical-target overlay metrology with optical microscopy, SEM and STEM
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.source.peerreviewyes
dc.source.beginpage1132508
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIV
dc.source.conferencedate20/02/2020
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2563606
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11325


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