Show simple item record

Recent advancements in 193 nm step and scan lithography

dc.contributor.authorGoethals, Mieke
dc.contributor.authorJaenen, Patrick
dc.contributor.authorPollers, Ingrid
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorRonse, Kurt
dc.contributor.authorHeskamp, B.
dc.contributor.authorDavies, G.
dc.date.accessioned2021-10-06T11:12:34Z
dc.date.available2021-10-06T11:12:34Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3466
dc.sourceIIOimport
dc.titleRecent advancements in 193 nm step and scan lithography
dc.typeJournal article
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage445
dc.source.endpage456
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue3
dc.source.volume12
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
3428.pdf
Size:
840.8Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record