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Recent advancements in 193 nm step and scan lithography
Publication:
Recent advancements in 193 nm step and scan lithography
Date
1999
Journal article
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3428.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Goethals, Mieke
;
Jaenen, Patrick
;
Pollers, Ingrid
;
Van Roey, Frieda
;
Ronse, Kurt
;
Heskamp, B.
;
Davies, G.
Journal
Journal of Photopolymer Science and Technology
Abstract
Description
Metrics
Views
1960
since deposited on 2021-10-06
402
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations
Metrics
Views
1960
since deposited on 2021-10-06
402
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations