Publication:

Recent advancements in 193 nm step and scan lithography

Date

1999
Journal article
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dc.contributor.authorGoethals, Mieke
dc.contributor.authorJaenen, Patrick
dc.contributor.authorPollers, Ingrid
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorRonse, Kurt
dc.contributor.authorHeskamp, B.
dc.contributor.authorDavies, G.
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-06T11:12:34Z
dc.date.available2021-10-06T11:12:34Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3466
dc.source.beginpage445
dc.source.endpage456
dc.source.issue3
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.volume12
dc.title

Recent advancements in 193 nm step and scan lithography

dc.typeJournal article
dspace.entity.typePublication
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