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193 nm lithography on a full field scanner

dc.contributor.authorGoethals, Mieke
dc.contributor.authorPollers, Ingrid
dc.contributor.authorJaenen, Patrick
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorRonse, Kurt
dc.contributor.authorHeskamp, B.
dc.contributor.authorDavies, G.
dc.date.accessioned2021-10-06T11:12:46Z
dc.date.available2021-10-06T11:12:46Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3467
dc.sourceIIOimport
dc.title193 nm lithography on a full field scanner
dc.typeProceedings paper
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage278
dc.source.endpage289
dc.source.conferenceOptical Microlithography XII
dc.source.conferencedate14/03/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3679


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