dc.contributor.author | Bhoir, Mandar | |
dc.contributor.author | Chiarella, Thomas | |
dc.contributor.author | Mitard, Jerome | |
dc.contributor.author | Horiguchi, Naoto | |
dc.contributor.author | Mohapatra, Nihar | |
dc.date.accessioned | 2021-10-28T20:19:00Z | |
dc.date.available | 2021-10-28T20:19:00Z | |
dc.date.issued | 2020 | |
dc.identifier.issn | 0018-9383 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/34743 | |
dc.source | IIOimport | |
dc.title | Vt extraction methodologies influence process induced Vt variability: Does this fact still hold for advanced technology nodes? | |
dc.type | Journal article | |
dc.contributor.imecauthor | Chiarella, Thomas | |
dc.contributor.imecauthor | Mitard, Jerome | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.orcidimec | Chiarella, Thomas::0000-0002-6155-9030 | |
dc.contributor.orcidimec | Mitard, Jerome::0000-0002-7422-079X | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 4691 | |
dc.source.endpage | 4695 | |
dc.source.journal | IEEE Transactions on Electron Devices | |
dc.source.issue | 11 | |
dc.source.volume | 67 | |
dc.identifier.url | https://ieeexplore.ieee.org/document/9216596 | |
imec.availability | Published - imec | |