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Vt extraction methodologies influence process induced Vt variability: Does this fact still hold for advanced technology nodes?

dc.contributor.authorBhoir, Mandar
dc.contributor.authorChiarella, Thomas
dc.contributor.authorMitard, Jerome
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorMohapatra, Nihar
dc.date.accessioned2021-10-28T20:19:00Z
dc.date.available2021-10-28T20:19:00Z
dc.date.issued2020
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34743
dc.sourceIIOimport
dc.titleVt extraction methodologies influence process induced Vt variability: Does this fact still hold for advanced technology nodes?
dc.typeJournal article
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.beginpage4691
dc.source.endpage4695
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue11
dc.source.volume67
dc.identifier.urlhttps://ieeexplore.ieee.org/document/9216596
imec.availabilityPublished - imec


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