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EUV photoresist reference metrology using TEM tomography

dc.contributor.authorBiedrzycki, Mark
dc.contributor.authorAdiga, Umesh
dc.contributor.authorBarnum, Andrew
dc.contributor.authorMoussa, Alain
dc.contributor.authorArjavac, Jason
dc.contributor.authorHaynes, Rose Marie
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.contributor.authorBatuk, Dmitry
dc.date.accessioned2021-10-28T20:19:33Z
dc.date.available2021-10-28T20:19:33Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34748
dc.sourceIIOimport
dc.titleEUV photoresist reference metrology using TEM tomography
dc.typeProceedings paper
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorBatuk, Dmitry
dc.contributor.orcidimecBatuk, Dmitry::0000-0002-6384-6690
dc.source.peerreviewyes
dc.source.beginpage113251T
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIV
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2552139
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11325


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