dc.contributor.author | Claes, Dieter | |
dc.contributor.author | Franco, Jacopo | |
dc.contributor.author | Collaert, Nadine | |
dc.contributor.author | Linten, Dimitri | |
dc.contributor.author | Heyns, Marc | |
dc.date.accessioned | 2021-10-28T20:45:32Z | |
dc.date.available | 2021-10-28T20:45:32Z | |
dc.date.issued | 2020 | |
dc.identifier.issn | 0021-8979 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/34910 | |
dc.source | IIOimport | |
dc.title | Positive bias temperature instability of HfO2-based gate stacks at reduced thermal budget for future CMOS technologies | |
dc.type | Journal article | |
dc.contributor.imecauthor | Claes, Dieter | |
dc.contributor.imecauthor | Franco, Jacopo | |
dc.contributor.imecauthor | Collaert, Nadine | |
dc.contributor.imecauthor | Linten, Dimitri | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Franco, Jacopo::0000-0002-7382-8605 | |
dc.contributor.orcidimec | Collaert, Nadine::0000-0002-8062-3165 | |
dc.contributor.orcidimec | Linten, Dimitri::0000-0001-8434-1838 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 104101 | |
dc.source.journal | Journal of Applied Physics | |
dc.source.issue | 10 | |
dc.source.volume | 128 | |
dc.identifier.url | https://doi.org/10.1063/5.0006110 | |
imec.availability | Published - imec | |