Publication:
Positive bias temperature instability of HfO2-based gate stacks at reduced thermal budget for future CMOS technologies
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1911 since deposited on 2021-10-28
1last month
Acq. date: 2026-02-25
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Views
1911 since deposited on 2021-10-28
1last month
Acq. date: 2026-02-25
Citations