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Positive bias temperature instability of HfO2-based gate stacks at reduced thermal budget for future CMOS technologies
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Authors
Claes, Dieter
;
Franco, Jacopo
;
Collaert, Nadine
;
Linten, Dimitri
;
Heyns, Marc
ISSN
0021-8979
Issue
10
Journal
Journal of Applied Physics
Volume
128
Title
Positive bias temperature instability of HfO2-based gate stacks at reduced thermal budget for future CMOS technologies
Publication type
Journal article
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