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On the dependencies of the stochastic patterning-failure cliffs in EUVL

dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-28T20:57:15Z
dc.date.available2021-10-28T20:57:15Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34960
dc.sourceIIOimport
dc.titleOn the dependencies of the stochastic patterning-failure cliffs in EUVL
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHendrickx, Eric
dc.source.peerreviewyes
dc.source.beginpage113230J
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography XI
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2552179
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11323


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