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Application of moist ozone gasphase for removal of resist and organic contamination in a novel tank-type processor

dc.contributor.authorHaug, Rainer
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorClaes, Martine
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorWolke, K.
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-06T11:18:11Z
dc.date.available2021-10-06T11:18:11Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3496
dc.sourceIIOimport
dc.titleApplication of moist ozone gasphase for removal of resist and organic contamination in a novel tank-type processor
dc.typeMeeting abstract
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1127
dc.source.conferenceElectrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. 99-2


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