dc.contributor.author | De Poortere, Etienne | |
dc.contributor.author | Schelcher, Guillaume | |
dc.contributor.author | Kissoon, Nicola | |
dc.contributor.author | Paolillo, Sara | |
dc.contributor.author | Tabery, Cyrus | |
dc.contributor.author | Halder, Sandip | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Mulkens, Jan | |
dc.contributor.author | McManus, Moyra | |
dc.date.accessioned | 2021-10-28T21:04:27Z | |
dc.date.available | 2021-10-28T21:04:27Z | |
dc.date.issued | 2020 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/34991 | |
dc.source | IIOimport | |
dc.title | E-TEST validation of EPE budget and metrology | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | De Poortere, Etienne | |
dc.contributor.imecauthor | Schelcher, Guillaume | |
dc.contributor.imecauthor | Kissoon, Nicola | |
dc.contributor.imecauthor | Paolillo, Sara | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.source.peerreview | no | |
dc.source.conference | SPIE advanced lithography - Metrology, Inspection, and Process Control for Microlithography XXXIV | |
dc.source.conferencedate | 23/02/2020 | |
dc.source.conferencelocation | online online | |
dc.identifier.url | https://spie.org/AL20/conferencedetails/metrology-inspection-process-control-manufacturing?SSO=1 | |
imec.availability | Published - imec | |