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Advances in understanding wet cleaning technology and the effect of metal contamination

dc.contributor.authorHeyns, Marc
dc.contributor.authorBearda, Twan
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorMertens, Paul
dc.contributor.authorMertens, S.
dc.contributor.authorMeuris, Marc
dc.contributor.authorSchaekers, Marc
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorVos, Rita
dc.contributor.authorWolke, K.
dc.date.accessioned2021-10-06T11:20:30Z
dc.date.available2021-10-06T11:20:30Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3508
dc.sourceIIOimport
dc.titleAdvances in understanding wet cleaning technology and the effect of metal contamination
dc.typeMeeting abstract
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorVos, Rita
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1061
dc.source.conferenceElectrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. 99-2


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