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Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography

dc.contributor.authorErdmann, Andreas
dc.contributor.authorMesilhy, Hazem
dc.contributor.authorEvanschitsky, Peter
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorTimmermans, Frank
dc.contributor.authorBauer, Markus
dc.date.accessioned2021-10-28T21:34:53Z
dc.date.available2021-10-28T21:34:53Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35102
dc.sourceIIOimport
dc.titlePerspectives and tradeoffs of novel absorber materials for high NA EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewyes
dc.source.beginpage1132309
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography XI
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose USA
dc.identifier.urlhttps://doi.org/10.1117/12.2550882
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11323


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