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Tomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes

dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorBekaert, Joost
dc.contributor.authorWiaux, Vincent
dc.contributor.authorNair, Vineet Vijayakrishnan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorDavydova, Natalia
dc.contributor.authorvan Dijk, Andre
dc.contributor.authorWang, Erik
dc.contributor.authorMaslow, Mark
dc.date.accessioned2021-10-28T21:45:22Z
dc.date.available2021-10-28T21:45:22Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35136
dc.sourceIIOimport
dc.titleTomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes
dc.typeProceedings paper
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorNair, Vineet Vijayakrishnan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorvan Dijk, Andre
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecNair, Vineet Vijayakrishnan::0000-0002-8970-2425
dc.source.peerreviewyes
dc.source.beginpage1151716
dc.source.conferenceExtreme Ultraviolet Lithography 2020
dc.source.conferencedate21/09/2020
dc.source.conferencelocationonline online
dc.identifier.urlhttps://doi.org/10.1117/12.2573073
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vo. 11517


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