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EUV lithography and the materials that propel it forward

dc.contributor.authorGallagher, Emily
dc.contributor.authorHendrickx, Eric
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorLeray, Philippe
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorPollentier, Ivan
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorRonse, Kurt
dc.contributor.authorTimmermans, Marina
dc.contributor.authorDe Simone, Danilo
dc.date.accessioned2021-10-28T21:48:30Z
dc.date.available2021-10-28T21:48:30Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35146
dc.sourceIIOimport
dc.titleEUV lithography and the materials that propel it forward
dc.typeMeeting abstract
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorTimmermans, Marina
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecTimmermans, Marina::0000-0001-9805-8259
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference2020 EUVL Workshop
dc.source.conferencedate7/06/2020
dc.source.conferencelocationOnline Online
dc.identifier.urlhttps://www.euvlitho.com/2020/2020%20EUVL%20Workshop%20Keynote%20Gallagher.pdf
imec.availabilityPublished - open access


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