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In situ HDP-CVD process diagnostics based on quadrupole mass spectrometry

dc.contributor.authorHughes, Carolyn
dc.contributor.authorVan Hoeymissen, Jan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-06T11:23:43Z
dc.date.available2021-10-06T11:23:43Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3524
dc.sourceIIOimport
dc.titleIn situ HDP-CVD process diagnostics based on quadrupole mass spectrometry
dc.typeProceedings paper
dc.contributor.imecauthorHeyns, Marc
dc.source.peerreviewno
dc.source.beginpage209
dc.source.endpage212
dc.source.conferenceProceedings 1999 IEEE International Symposium on Semiconductor Manufacturing Conference
dc.source.conferencedate11/10/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec


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