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dc.contributor.authorHigashi, Yusuke
dc.contributor.authorKaczer, Ben
dc.contributor.authorVerhulst, Anne
dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorRonchi, Nicolo
dc.contributor.authorMcMitchell, Sean
dc.contributor.authorBanerjee, Kaustuv
dc.contributor.authorDi Piazza, Luca
dc.contributor.authorSuzuki, Masamichi
dc.contributor.authorLinten, Dimitri
dc.contributor.authorVan Houdt, Jan
dc.date.accessioned2021-10-28T22:34:25Z
dc.date.available2021-10-28T22:34:25Z
dc.date.issued2020
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35275
dc.sourceIIOimport
dc.titleInvestigation of imprint in FE-HfO2 and its recovery
dc.typeJournal article
dc.contributor.imecauthorHigashi, Yusuke
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorVerhulst, Anne
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorRonchi, Nicolo
dc.contributor.imecauthorMcMitchell, Sean
dc.contributor.imecauthorBanerjee, Kaustuv
dc.contributor.imecauthorDi Piazza, Luca
dc.contributor.imecauthorSuzuki, Masamichi
dc.contributor.imecauthorLinten, Dimitri
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecVerhulst, Anne::0000-0002-3742-9017
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecRonchi, Nicolo::0000-0002-7961-4077
dc.contributor.orcidimecBanerjee, Kaustuv::0000-0001-8003-6211
dc.contributor.orcidimecLinten, Dimitri::0000-0001-8434-1838
dc.contributor.orcidimecVan Houdt, Jan::1234-1234-1234-1235
dc.source.peerreviewyes
dc.source.beginpage4911
dc.source.endpage4917
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue11
dc.source.volume67
dc.identifier.urlhttps://ieeexplore.ieee.org/document/9214848
imec.availabilityPublished - imec


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