dc.contributor.author | Hikavyy, Andriy | |
dc.contributor.author | Porret, Clément | |
dc.contributor.author | Vohra, Anurag | |
dc.contributor.author | Ayyad, Mustafa | |
dc.contributor.author | Douhard, Bastien | |
dc.contributor.author | Loo, Roger | |
dc.date.accessioned | 2021-10-28T22:35:13Z | |
dc.date.available | 2021-10-28T22:35:13Z | |
dc.date.issued | 2020-08 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/35277 | |
dc.source | IIOimport | |
dc.title | Investigation of low temperature epitaxial SiGe:P in view of source/drain application for 5nm technology node and below | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Hikavyy, Andriy | |
dc.contributor.imecauthor | Porret, Clément | |
dc.contributor.imecauthor | Vohra, Anurag | |
dc.contributor.imecauthor | Ayyad, Mustafa | |
dc.contributor.imecauthor | Douhard, Bastien | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
dc.contributor.orcidimec | Porret, Clément::0000-0002-4561-348X | |
dc.contributor.orcidimec | Vohra, Anurag::0000-0002-2831-0719 | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.source.peerreview | yes | |
dc.source.beginpage | G03-1735 | |
dc.source.conference | ECS-2020 Prime Meeting; Symposium G03: SiGe, Ge, and Related Compounds: Materials, Processing, and Devices 9 | |
dc.source.conferencedate | 4/10/2020 | |
dc.source.conferencelocation | Honolulu USA | |
dc.identifier.url | https://ecs.confex.com/ecs/prime2020/meetingapp.cgi/Paper/143409 | |
imec.availability | Published - imec | |