dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Aubert, Remko | |
dc.contributor.author | Nair, Vineet Vijayakrishnan | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Wu, Chien-ching | |
dc.contributor.author | de Rooij-Lohmann, Veronique | |
dc.contributor.author | Eslstgeest, Dorus | |
dc.contributor.author | lenseL, Henk | |
dc.contributor.author | Soltwich, Victor | |
dc.contributor.author | Hoenicke, Philipp | |
dc.contributor.author | Kolbe, Michael | |
dc.contributor.author | Scholze, Frank | |
dc.date.accessioned | 2021-10-28T22:58:54Z | |
dc.date.available | 2021-10-28T22:58:54Z | |
dc.date.issued | 2020 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/35337 | |
dc.source | IIOimport | |
dc.title | Study of EUV reticle storage effects through exposure on EBL2 and NXE | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Aubert, Remko | |
dc.contributor.imecauthor | Nair, Vineet Vijayakrishnan | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Nair, Vineet Vijayakrishnan::0000-0002-8970-2425 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 115170Z | |
dc.source.conference | Extreme Ultraviolet Lithography 2020 | |
dc.source.conferencedate | 21/09/2020 | |
dc.source.conferencelocation | online USA | |
dc.identifier.url | https://doi.org/10.1117/12.2573125 | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE; Vol. 11517 | |