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Study of EUV reticle storage effects through exposure on EBL2 and NXE

dc.contributor.authorJonckheere, Rik
dc.contributor.authorAubert, Remko
dc.contributor.authorNair, Vineet Vijayakrishnan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorWu, Chien-ching
dc.contributor.authorde Rooij-Lohmann, Veronique
dc.contributor.authorEslstgeest, Dorus
dc.contributor.authorlenseL, Henk
dc.contributor.authorSoltwich, Victor
dc.contributor.authorHoenicke, Philipp
dc.contributor.authorKolbe, Michael
dc.contributor.authorScholze, Frank
dc.date.accessioned2021-10-28T22:58:54Z
dc.date.available2021-10-28T22:58:54Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35337
dc.sourceIIOimport
dc.titleStudy of EUV reticle storage effects through exposure on EBL2 and NXE
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorAubert, Remko
dc.contributor.imecauthorNair, Vineet Vijayakrishnan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecNair, Vineet Vijayakrishnan::0000-0002-8970-2425
dc.source.peerreviewyes
dc.source.beginpage115170Z
dc.source.conferenceExtreme Ultraviolet Lithography 2020
dc.source.conferencedate21/09/2020
dc.source.conferencelocationonline USA
dc.identifier.urlhttps://doi.org/10.1117/12.2573125
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11517


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