Publication:

Stochastic printing behavior of non-local mask deficiencies in EUV lithography

Date

2020
Proceedings Paper
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Author(s)

Jonckheere, Rik  
;
Melvin III, Lawrence

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Description

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1875 since deposited on 2021-10-28
Acq. date: 2026-02-26

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1875 since deposited on 2021-10-28
Acq. date: 2026-02-26

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